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ハラ トモヒコ
原 知彦
HARA TOMOHIKO
所属
総合科学技術研究機構
職名
研究員
論文
1.
2024/01
DLTS analysis of interface and near-interface bulk defects induced by TCO-plasma deposition in carrier-selective contact solar cells │ AIP advance │ 14 (1),015202 (共著)
2.
2023/01
Evaluation of Damage in Crystalline Silicon Substrate Induced by Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Films │ Japanese Journal of Applied Physics │ 12,015003 (共著)
3.
2022/09
Analysis of recombination centers near an interface of a metal–SiO
2
–Si structure by double carrier pulse deep-level transient spectroscopy │ AIP advance │ 12 (9),095316 (共著)
4.
2022/03
DLTS with Bayesian Inference for Analyzing RPD Induced Defects in Bulk near SiO
2
/Si Interface │ ECS Journal of Solid State Science and Technology │ 11,035002 (共著)
5.
2021/05/26
Light Induced Recombination Center at SiO
2
/Si Interface by the Reactive Plasma Deposition │ 17,399-405頁 (共著)
6.
2021/04
Evaluation of correlation between fill factor and high mobility transparent conductive oxide film deposition temperature in the silicon heterojunction solar cells │ Materials Science in Semiconductor Processing │ 132,105887 (共著)
7.
2021/02/04
Simulation study on lateral minority carrier transport in the surface inversion layer of the p-aSi:H/i-aSi:H/cSi heterojunction solar cell │ Japanese Journal of Applied Physics │ 60,026503 (共著)